Photoelectron emission experiments with ECR-driven multi-dipolar negative ion plasma source
Finna-arvio
Photoelectron emission experiments with ECR-driven multi-dipolar negative ion plasma source
Photoelectron emission measurements have been performed using a 2.45 GHz ECR-driven multi-dipolar plasma source in a low pressure hydrogen discharge. Photoelectron currents induced by light emitted from ECR zone and H− production region are measured from Al, Cu, Mo, Ta, and stainless steel (SAE 304) surfaces as a function of microwave power and neutral hydrogen pressure. The total photoelectron current from the plasma chamber wall is estimated to reach values up to 1 A for 900 W of injected microwave power. It is concluded that the volumetric photon emission rate in wavelength range relevant for photoelectron emission is a few times higher in arc discharge.
Tallennettuna:
Kieli |
englanti |
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Sarja | AIP Conference Proceedings |
Aiheet | |
ISSN |
0094-243X |
Kuuluu kokonaisuuteen |