Tietueen sitaatit
APA-viiteBao, Y., Laitinen, M., Sajavaara, T., Savin, H., laitos, F., Physics, D. o., . . . Laboratory, A. (2017). Ozone-Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation. Wiley.
Chicago-tyylinen lähdeviittausBao, Yameng, Mikko Laitinen, Timo Sajavaara, Hele Savin, Fysiikan laitos, Department of Physics, Kiihdytinlaboratorio, ja Accelerator Laboratory. Ozone-Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation. Wiley, 2017.
MLA-viiteBao, Yameng, et al. Ozone-Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation. Wiley, 2017.
Harvard-tyylinen lähdeviittausBao, Y., Laitinen, M., Sajavaara, T., Savin, H., laitos, F., Physics, D. o., . . . Laboratory, A. 2017. Ozone-Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation. Wiley.